Photoassisted chemical smoothing of AlGaN surface after laser lift-off-Reference-Cited by-同舟云学术

Photoassisted chemical smoothing of AlGaN surface after laser lift-off

Published:2020-07 Issue:4 Volume:38 Page:042207
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Zheng Zhongming¹,Long Hao¹,Matta Samuel²^ORCID,Leroux Mathieu²,Brault Julien²^ORCID,Ying Leiying¹,Zheng Zhiwei¹,Zhang Baoping¹

Affiliation:

1. Department of Electronic Engineering, Optoelectronics Engineering Research Center, School of Electronic Science and Engineering (National Model Microelectronics College), Xiamen University, Xiamen 361005, Fujian, China

2. Université Côte d’Azur, CNRS-CRHEA Centre de Recherche sur L’Hétéro-Epitaxie et ses Applications-Centre National de la Recherche Scientifique, Valbonne 06560, France

Funder

National Key R&D Program of China

Nation Natural Science Foundation of China

Natural Science Foundation of Fujian Province of China

ANR Project NANOGANUV

Science Challenge Project

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000192

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