On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand-Reference-Cited by-同舟云学术

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On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand

Published:2020-07 Issue:4 Volume:38 Page:043004
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Nguyen Vy Thi Hoang¹^ORCID,Jensen Flemming¹,Hübner Jörg¹,Leussink Pele²,Jansen Henri¹

Affiliation:

1. DTU Nanolab, Technical University of Denmark, Ørsteds Plads, Building 347, 2800 Kgs. Lyngby, Denmark

2. MESA+ Nanolab, University of Twente, Drienerlolaan 5, 7522 NB Enschede, Netherlands

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000196

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Formation of Black Silicon in a Process of Plasma Etching with Passivation in a SF6/O2 Gas Mixture;Nanomaterials;2024-05-28

2. Formation of Si nanopillars through partial sacrificing in super passivation reactive ion etching;Nanotechnology;2024-05-16

3. CMOS-Compatible Wafer-Level Double-layer Silicon Nanograss through Reactive Ion Etching for Applications in Optics;ACS Applied Nano Materials;2024-05-03

4. Black Silicon as Anti-Reflective Structure for Infrared Imaging Applications;Nanomaterials;2023-12-20

5. Nanoimprinted Hierarchical Micro-/Nanostructured Substrates for the Growth of Cardiomyocyte Fibers;Nanomanufacturing;2023-11-07

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