Reaction between nitrogen gas and silicon species during pulsed laser ablation-Reference-Cited by-同舟云学术

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Reaction between nitrogen gas and silicon species during pulsed laser ablation

Published:2003-09 Issue:5 Volume:21 Page:1680-1682
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Umezu Ikurou,Inada Mitsuru,Kohno Kimihiro,Yamaguchi Tomohiro,Makino Toshiharu,Sugimura Akira

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1598974

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoparticle Formation and Deposition by Pulsed Laser Ablation;Practical Applications of Laser Ablation;2021-07-14

2. Laser-generated Cu plasma in vacuum and in nitrogen gas;Vacuum;2020-08

3. Formation of core-shell structured silicon nanoparticles during pulsed laser ablation;Journal of Applied Physics;2010-05

4. Surface hydrogenation of silicon nanocrystallites during pulsed laser ablation of silicon target in hydrogen background gas;Journal of Applied Physics;2008-06

5. Formation of nanoscale fine-structured silicon by pulsed laser ablation in hydrogen background gas;Physical Review B;2007-07-23

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