Influence of sputtering conditions on microstructure and mechanical properties of Zr–Si–N films prepared by radio-frequency-reactive sputtering-Reference-Cited by-同舟云学术

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Influence of sputtering conditions on microstructure and mechanical properties of Zr–Si–N films prepared by radio-frequency-reactive sputtering

Published:2003-09 Issue:5 Volume:21 Page:1791-1795
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Zhou M.,Nose M.,Deguchi Y.,Mae T.,Nogi K.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1598976

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of Substrate Temperature on Microstructure of Zirconium Silicon Nitride Thin Films Deposited by Reactive Magnetron Sputtering;Materials Research;2023

2. Structural investigation of ZrN+Si₃N₄ thin films co-deposited by magnetron sputtering;Surface Engineering;2022-09-02

3. Effect of Silicon Content in Functional Properties of Thin Films;Silicon Materials;2019-08-07

4. Self-organized anisotropic (Zr1−Si )N nanocomposites grown by reactive sputter deposition;Acta Materialia;2015-01

5. Phase stabilities and decomposition mechanism in the Zr–Si–N system studied by combined ab initio DFT and thermodynamic calculation;Acta Materialia;2011-01

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