Optimization of solvent development in radiation induced graft lithography of poly(methylmethacrylate)-Reference-Cited by-同舟云学术

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Optimization of solvent development in radiation induced graft lithography of poly(methylmethacrylate)

Published:1986-01 Issue:1 Volume:4 Page:403
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:
Short-container-title:J. Vac. Sci. Technol. B

Author:

Kim S. Y.

Publisher

American Vacuum Society

Subject

General Engineering

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Numerical simulation and experimental study of resonance characteristics of QCM-P devices operating in liquid and their application in biological detection;Sensors and Actuators B: Chemical;2015-12

2. The Physics of Ion-Beam Lithography;The Physics of Submicron Lithography;1992

3. Polymer Dissolution Characteristics of Radiation-Induced Grafted Resist in X-Ray Lithography;Japanese Journal of Applied Physics;1991-02-01

4. Ultralow dose effects in ion-beam induced grafting of polymethylmethacrylate (PMMA);Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1987-01

5. Enhanced plasma etch resistance of acrylic acid–calcium acetate modified poly(methylmethacrylate);Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1987-01

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