Atomic layer deposition of Pt nanoparticles using dimethyl (N, N–dimethyl-3-butene-1-amine−N) platinum and H2 reactant and its application to 2D WS2 photodetectors

Author:

Shin Dain1ORCID,Sohn Inkyu1ORCID,Kim Donghyun1,Kim Jaehyeok1ORCID,Nam Taewook12ORCID,Kim Youngjun1,Park Jusang3ORCID,Nakazawa Tatsuya14ORCID,Chung Seung-min1,Kim Hyungjun1ORCID

Affiliation:

1. School of Electrical and Electronic Engineering, Yonsei University 1 , 50 Yonsei-Ro, Seodaemun-Gu, Seoul 120-749, Republic of Korea

2. Department of Chemistry, University of Colorado Boulder 2 , Boulder, Colorado 80309

3. Advanced Institute of Convergence Technology, Seoul National University 3 , Suwon 16229, Republic of Korea

4. Metallic Materials Development Department, TANAKA Kikinzoku Kogyo K.K. Isehara Technical Center 4 , 28 Suzukawa, Isehara, Kanagawa 259-1146, Japan

Abstract

2D transition metal dichalcogenides (2D TMDCs) have thin and flexible structures and can be widely applied to nanoelectronics technology as a representative of 2D materials. Research studies on the surface functionalization of 2D TMDCs with nanoparticles have been actively conducted for fabrication of high-performance devices. Specifically, platinum (Pt) has attracted significant attention as a surface functionalization material in various applications, including photosensors, biosensors, and gas sensors due to its effective catalytic effect and excellent corrosion resistance. However, solution-based methods and PVD technologies, widely used for Pt nanoparticle synthesis, have difficulties forming fine particles dispersed on nanomaterials. Atomic layer deposition (ALD) is emerging as an advantageous method for forming nanoparticles, and dimethyl (N,N-dimethyl-3-buten-1-amine-N) platinum (DDAP) can overcome disadvantages of conventional ALD Pt precursors. In this study, we successfully synthesized Pt films using hydrogen as a new reactant in the DDAP-based ALD Pt process and evaluated formation of nanoparticles on SiO2/Si substrates. Subsequently, the ALD Pt-functionalized photodetector was fabricated with 2D WS2, a representative visible-light photodetector material, and improvement of photocurrent was confirmed by providing additional carriers via the localized surface plasmon resonance phenomenon. Furthermore, preferentially growing at high surface energy points, such as defects on WS2 nanosheets, can suppress the capture of photoexcited electrons by defects, consequently extending the carrier lifetime and preventing surface oxidation of the device. In the wavelength range of 500–1200 nm, the photoresponsivity of the ALD Pt-functionalized WS2 photodetector was improved more than 10–20 times compared to pristine WS2, and the response time was also noticeably improved. This study presents a novel approach to Pt functionalization using ALD, opening new possibilities for advanced nanodevice applications.

Funder

TANAKA Kikinzoku Kogyo K.K.

National Research Foundation of Korea

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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