Low temperature plasma enhanced deposition of GaP films on Si substrate-Reference-Cited by-同舟云学术

Low temperature plasma enhanced deposition of GaP films on Si substrate

Published:2018-03 Issue:2 Volume:36 Page:021302
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Gudovskikh Alexander S.¹,Morozov Ivan A.¹,Uvarov Alexander V.¹,Kudryashov Dmitriy A.¹,Nikitina Ekaterina V.¹,Bukatin Anton S.¹,Nevedomskiy Vladimir N.²,Kleider Jean-Paul³

Affiliation:

1. Nanotechnology Centre, St. Petersburg Academic University RAS, Hlopina Str. 8/3, St.-Petersburg 194021, Russia

2. A. F. Ioffe Physical-Technical Institute RAS, Polytechnicheskaya Str. 26, St.-Petersburg 194021, Russia

3. GeePs, Group of Electrical Engineering-Paris, CNRS, CentraleSupélec, Univ. Paris-Sud, Université Paris-Saclay, Sorbonne Universités, UPMC Univ Paris 06, 11 rue Joliot-Curie, 91192 Gif-sur-Yvette Cedex, France

Funder

Russian Science Foundation

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4999409

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