Author:
Hakamata Y.,Iga T.,Ono Y.,Natsui K.,Sato T.
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
6 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The Low-Pressure Plasma Processing Environment;Handbook of Physical Vapor Deposition (PVD) Processing;1998
2. Multicusp Electron-Cyclotron-Resonance Plasma Source Working with Microwaves Radially Injected through an Annular Slit;Japanese Journal of Applied Physics;1994-03-15
3. A broad beam microwave N+ ion source;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1993-05
4. A broad beam microwave O+ion source;Journal of Physics D: Applied Physics;1992-07-14
5. An ECR microwave plasma cathode for ion sources with electrostatic reflex containment;Review of Scientific Instruments;1992-04