F2 adsorption on Si observed with SIMS and QCM
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Link
http://avs.scitation.org/doi/pdf/10.1116/1.571340
Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Time-of-flight secondary ion mass spectrometry measurements of a fluorocarbon-based self-assembled monolayer on Si;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2006-07
2. Theoretical studies of polyatomic reactions on metal surfaces: Al + SiCl4 and Cu + SiCl4 model systems;Surface Science;1993-03
3. Study of fluorine (XeF2) adsorption and of oxygen/fluorine coadsorption on silicon using infrared reflection absorption spectroscopy;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1992-11
4. Adsorption and desorption of CF3I on Ru(001);Surface Science;1990-11
5. The microwave spectrum of SiF+;The Journal of Chemical Physics;1988-11
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