Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects-Reference-Cited by-同舟云学术

Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects

Published:2020-09 Issue:5 Volume:38 Page:053401
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Anğay Fırat¹,Löfler Lukas²,Tetard Florent³^ORCID,Eyidi Dominique¹,Djemia Philippe³^ORCID,Holec David²,Abadias Gregory¹^ORCID

Affiliation:

1. Institut Pprime, UPR 3346, CNRS-Université de Poitiers-ENSMA, 11 Boulevard Marie et Pierre Curie, TSA 41123, 86073 Poitiers Cedex 9, France

2. Department of Materials Science, Montanuniversität Leoben, Franz-Josef-Strasse 18, Leoben A-8700, Austria

3. Laboratoire des Sciences des Procédés et des Matériaux, UPR 3407 CNRS, Université Sorbonne Paris Nord, Alliance Sorbonne Paris Cite, 99 Avenue J.B. Clément, 93430 Villetaneuse, France

Funder

Scientific and Technical Research Council of Turkey

Austrian Science Fund

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/6.0000292

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