Engineering anisotropic magnetoresistance of Hall bars with interfacial organic layers

Author:

Park Jun Hong123ORCID,Ribeiro Mario12,Pham Thi Kim Hang2,Lee Nyun Jong4,Eom Tai-woon5,Jo Junhyeon6,Park Seung-Young7,Rhim Sonny H.4,Nakamura Kohji8,Yoo Jung-Woo6,Kim Tae Hee12

Affiliation:

1. Center for Quantum Nanoscience, Institute for Basic Science (IBS), Seoul 03760, South Korea

2. Department of Physics, Ewha Womans University, Seoul 03760, South Korea

3. School of Materials Science and Engineering, Gyeongsang National University, Jinju 52828, South Korea

4. Department of Physics and Energy Harvest Storage Research Center, University of Ulsan, Ulsan 44610, South Korea

5. RNDWARE Co., Ltd., Daejeon 34133, South Korea

6. School of Materials Science and Engineering-Low Dimensional Carbon Materials Center, Ulsan National Institute of Science and Technology, Ulsan 44919, South Korea

7. Center for Scientific Instrumentation, Korea Basic Science Institute, Daejeon 34133, South Korea

8. Department of Physics Engineering, Mie University, Tsu, Mie 514-8507, Japan

Funder

National Research Foundation of Korea

National Research Council of Science and Technology

Ministry of Science and ICT, South Korea

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

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