Three-dimensional deposition of TiN film using low frequency (50 Hz) plasma chemical vapor deposition-Reference-Cited by-同舟云学术

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Three-dimensional deposition of TiN film using low frequency (50 Hz) plasma chemical vapor deposition

Published:1997-07 Issue:4 Volume:15 Page:1897-1901
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Shimozuma M.,Date H.,Iwasaki T.,Tagashira H.,Yoshino M.,Yoshida K.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580657

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Review of Plasma Processing for Polymers and Bio-Materials Using a Commercial Frequency (50/60 Hz)-Generated Discharge;Polymers;2023-06-28

2. Nanometer-Scale Surface Modification Using Scanning Force Microscopy in Chemically Active Environments;Surface Modification and Mechanisms;2004-04-30

3. Optimization of Titanium Nitride Rapid Thermal CVD Process;Chemical Vapor Deposition;2000-06

4. Properties of TiN Films on Heated Substrate Below 550°C by 50 Hz Plasma-Enhanced Chemical Vapor Deposition;Japanese Journal of Applied Physics;2000-03-15

5. Properties of TiN–TiC multilayer coatings using plasma-assisted chemical vapor deposition;Surface and Coatings Technology;1999-09

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