Nanometer metrology by means of backscattered electrons
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Published:1995-03
Issue:2
Volume:13
Page:321
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
3 articles.
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1. Tools for Mask Image Evaluation;Handbook of Photomask Manufacturing Technology;2005-04-07
2. Photomask Critical Dimension Metrology in the Scanning Electron Microscope;Handbook of Photomask Manufacturing Technology;2005-04-07
3. Special Techniques in SEM;Springer Series in Optical Sciences;1998