Fabrication of high aspect ratio and tilted nanostructures using extreme ultraviolet and soft x-ray interference lithography-Reference-Cited by-同舟云学术

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Fabrication of high aspect ratio and tilted nanostructures using extreme ultraviolet and soft x-ray interference lithography

Published:2021-07 Issue:4 Volume:39 Page:042601
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B
language:en
Short-container-title:Journal of Vacuum Science & Technology B

Author:

Mojarad Nassir¹,Kazazis Dimitrios¹^ORCID,Ekinci Yasin¹^ORCID

Affiliation:

1. Paul Scherrer Institute, 5232 Villigen, Switzerland

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0001089

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Evaluation of the X-ray/EUV Nanolithography Facility at AS through wavefront propagation simulations;Journal of Synchrotron Radiation;2024-04-17

2. Fabrication of large-area photonic crystal-modified X-ray scintillator imager for optical coding imaging;Optics Express;2024-02-27

3. Oriented bouncing of droplets with a small Weber number on inclined one-dimensional nanoforests;Nanoscale;2024

4. Micromachined piezoelectric Lamb wave resonators: a review;Journal of Micromechanics and Microengineering;2023-09-22

5. Research progress in fabrication of nanofluidic channels and applications br;CAILIAO GONGCHENG;2022

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