In situx-ray diffraction studies concerning the influence of Al concentration on the texture development during sputter deposition of Ti–Al

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In situx-ray diffraction studies concerning the influence of Al concentration on the texture development during sputter deposition of Ti–Al–N thin films

Published:2005-09 Issue:5 Volume:23 Page:1384-1391
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Beckers M.,Schell N.,Martins R. M. S.,Mücklich A.,Möller W.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.2011400

Cited by 22 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface microtexture and wettability analysis of quasi two-dimensional (Ti, Al)N thin films using fractal geometry;Surface and Coatings Technology;2021-09

2. On the possibility of synthesizing multilayered coatings in the (Ti,Al)N system by RGPP: A microstructural study;Surface and Coatings Technology;2019-09

3. Influence of film thickness on the structural transition cubic/hexagonal within Ti0.38Al0.62N films;Thin Solid Films;2018-03

4. Conductive nitrides: Growth principles, optical and electronic properties, and their perspectives in photonics and plasmonics;Materials Science and Engineering: R: Reports;2018-01

5. The competitive growth of cubic domains in Ti1–xAlxN films studied by diffraction anomalous near-edge structure spectroscopy;Journal of Synchrotron Radiation;2015-10-01

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