Effectiveness of multipass and multirow writing methods for massively parallel e-beam systems
Author:
Affiliation:
1. Department of Electrical and Computer Engineering, Auburn University, Auburn, Alabama 36849
2. Samsung Electronics, Mask Development Team, 16 Banwol-Dong, Hwasung, Kyunggi-Do 18448, South Korea
Funder
Samsung
Publisher
American Vacuum Society
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://avs.scitation.org/doi/pdf/10.1116/6.0000547
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Wavefront aberrations measurement of freeform surface based on computer-generated hologram technology;Fifth International Symposium on High Power Laser Science and Engineering (HPLSE 2023);2023-12-22
2. Generalized performance optimization for massively-parallel electron-beam systems;Journal of Vacuum Science & Technology B;2023-06-26
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