Adsorption and thermal dissociation of disilane (Si2H6) on Si(100)2×1-Reference-Cited by-同舟云学术

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Adsorption and thermal dissociation of disilane (Si2H6) on Si(100)2×1

Published:1990-01 Issue:1 Volume:8 Page:61-67
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Suda Y.,Lubben D.,Motooka T.,Greene J. E.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576356

Cited by 95 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Preparation and Stability of Silyl Adlayers on 2×1-Reconstructed and Modified Si(100) Surfaces;Journal of the Korean Vacuum Society;2009-01-30

2. Chapter 16 Growth and Etching of Semiconductors;Dynamics;2008

3. Energetics and Rate Constants of Si2H6 and Ge2H6 Dissociative Adsorption on Dimers of SiGe(100)-2 × 1;The Journal of Physical Chemistry C;2007-08-22

4. SiH2adsorption on the single dimer vacancy of the Si(100) surface;Journal of Physics: Condensed Matter;2006-07-14

5. Simulation of SiH4 adsorption on H/Si(100) surfaces;Thin Solid Films;2006-04

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