Polymerization of dual ion beam deposited CNx films with increasing N content-Reference-Cited by-同舟云学术

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Polymerization of dual ion beam deposited CNx films with increasing N content

Published:1999-03 Issue:2 Volume:17 Page:584-592
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Ng Y. M.,Ong C. W.,Zhao X.-A.,Choy C. L.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.581622

Cited by 24 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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2. Chemical Structure, Optical and Dielectric Properties of PECVD SiCN Films Obtained from Novel Precursor;Coatings;2022-11-18

3. Organosilicon compounds as single-source precursors for SiCN films production;Journal of Organometallic Chemistry;2022-01

4. Effect of Nitrogen on the Growth of Carbon Nitride Thin Films Deposited by RF Plasma Enhanced Chemical Vapor Deposition;Nanoscience and Nanotechnology Letters;2012-01-01

5. On the absence of post-plasma etch surface and line edge roughness in vinylpyridine resists;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-07

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