Controlled thin-film deposition of α or β Ga2O3 by ion-beam sputtering
Author:
Affiliation:
1. Institute for Experimental Physics I and Center for Materials Research (LaMa), Justus Liebig University Giessen, DE-35392 Giessen, Germany
Funder
Deutsche Forschungsgemeinschaft
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/6.0000619
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