Approaching ultrathin VO2 films on sapphire (001) substrates by biased reactive sputtering: Characteristic morphology and its effect on the infrared-light switching-Reference-Cited by-同舟云学术

Approaching ultrathin VO2 films on sapphire (001) substrates by biased reactive sputtering: Characteristic morphology and its effect on the infrared-light switching

Published:2021-07 Issue:4 Volume:39 Page:043401
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Okimura Kunio¹^ORCID,Sakai Joe²^ORCID,Kuwahara Masashi³^ORCID,Zaghrioui Mustapha⁴^ORCID,Uehara Yoichi⁵^ORCID

Affiliation:

1. School of Engineering, Tokai University, 4-1-1 Kitakaname, Hiratsuka-shi, Kanagawa 259-1292, Japan

2. Institut Català de Nanociència i Nanotecnologia (ICN2), UAB Campus, ICN2 Building, 08193 Bellaterra, Spain

3. National Institute of Advanced Industrial Science and Technology, Tsukuba-shi, Ibaraki 305-8560, Japan

4. GREMAN, UMR 7347 CNRS, Université François Rabelais de Tours, Parc de Grandmont, 37200 Tours, France

5. Research Institute of Electrical Communication, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan

Funder

Cooperative research Project Program of the Research Institute of Electrical Communication, Tohoku University

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0001023

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