Use of multilayer‐monochromatized synchrotron radiation for direct pattern formation and Auger electron spectroscopy-Reference-Cited by-同舟云学术

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Use of multilayer‐monochromatized synchrotron radiation for direct pattern formation and Auger electron spectroscopy

Published:1992-01 Issue:1 Volume:10 Page:163-166
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Oshima Masaharu,Maeyama Satoshi,Takenaka Hisataka,Ishii Yoshikazu,Sugahara Hirohiko

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.578130

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study of adsorption on radiation-damaged CaF2(111) surfaces;Applied Surface Science;2000-07

2. Characterization of LiF and CaF2 surfaces using MIES and UPS (HeI);Journal of Electron Spectroscopy and Related Phenomena;1998-03

3. Radio frequency magnetron sputter deposition of CaF2 films;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1998-03

4. Surface colloid evolution during low-energy electron irradiation of CaF2(111);Surface Science;1996-11

5. Synchrotron radiation induced reactions on surfaces: mechanisms and applications;Applied Surface Science;1994-05

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