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Si-containing block copolymers for self-assembled nanolithography

  • Published:2008-11 Issue:6 Volume:26 Page:2489-2494
  • ISSN:1071-1023
  • Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
  • language:en
  • Short-container-title:J. Vac. Sci. Technol. B

Author:

Ross C. A.1,Jung Y. S.1,Chuang V. P.1,Ilievski F.1,Yang J. K. W.2,Bita I.1,Thomas E. L.1,Smith Henry I.2,Berggren K. K.2,Vancso G. J.3,Cheng J. Y.4

Affiliation:

1. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

2. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139

3. MESA+ Research Institute, University of Twente, P.O. Boc 217, 7500 Enschede, The Netherlands

4. IBM Almaden Research Center, San Jose, California

Funder

NSF

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

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