Three-dimensional alignment with 10nm order accuracy in electron-beam lithography on rotated sample for three-dimensional nanofabrication
Author:
Affiliation:
1. NTT Basic Research Laboratories, NTT Corporation, 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan
Publisher
American Vacuum Society
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
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