Monolayer calibration of endofullerenes with x-ray absorption from implanted keV ion doses

Author:

Lee Wei Chuang1ORCID,Yu Lebin1ORCID,Oscarsson Johan2ORCID,Ochapski Michal W.3ORCID,Sagehashi Ryunosuke1ORCID,Zhang Yang4ORCID,Popov Alexey A.4ORCID,Gebeyehu Zewdu M.3,Martini Leonardo3ORCID,Forti Stiven3ORCID,Coletti Camilla3ORCID,Delley Bernard5ORCID,Muntwiler Matthias5ORCID,Primetzhofer Daniel2ORCID,Greber Thomas1ORCID

Affiliation:

1. Physik-Institut, University of Zürich 1 , Zürich CH-8057, Switzerland

2. Department of Physics and Astronomy, Uppsala University 2 , Uppsala SE-75120, Sweden

3. Graphene Labs, Istituto Italiano di Tecnologia 3 , Genova IT-16163, Italy

4. Leibniz-Institute for Solid State and Materials Research (IFW) 4 , Dresden D-01069, Germany

5. Swiss Light Source, Paul Scherrer Institut (PSI) 5 , Villigen CH-5232, Switzerland

Abstract

X-ray absorption spectroscopy (XAS) has the highest sensitivity for chemical element detection on surfaces. With this approach, small amounts of lanthanide-containing endofullerene molecules (Ho3N@C80) have been measured by total electron yield at a low flux bending magnet beamline. The monolayer coverage is calibrated by extrapolating the signals of constant doses (3×1014 cm−2) of Ho ions implanted into SiO2 with energies between 2 and 115 keV. At room temperature, the Ho XAS spectra of the molecules and implanted ions indicate trivalent but not identical Ho ground states. Still, this approach demonstrates a way for calibration of small coverages of molecules containing open core-shell elements.

Funder

Schweizerischer Nationalfonds zur Förderung der Wissenschaftlichen Forschung

Swedish Research Council VR-RFI

HORIZON EUROPE Framework Programme

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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