Growth of Mg films on H-terminated Si (111)-Reference-Cited by-同舟云学术

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Growth of Mg films on H-terminated Si (111)

Published:1999-09 Issue:5 Volume:17 Page:2911-2914
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Saiki Koichiro,Nishita Kouichi,Ariga Yasuo,Koma Atsushi

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.581959

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. High quality Mg(0001) films grown on Si(111)3×3-B surface at room temperature;Thin Solid Films;2022-07

2. Recovering the Semiconductor Properties of the Epitaxial Group V 2D Materials Antimonene and Arsenene;The Journal of Physical Chemistry C;2018-04-02

3. Fabrication of (200)-Oriented TiN Films on Si (100) Substrates by DC Magnetron Sputtering;IEEE Transactions on Applied Superconductivity;2015-06

4. High resolution photoemission study of the formation and thermal stability of Mg silicide on silicon;Thin Solid Films;2011-01

5. Nanoscale structure and the hydrogenation of Pd-capped magnesium thin films prepared by plasma sputter and pulsed laser deposition;Journal of Alloys and Compounds;2007-08

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