A warning concerning the use of glass capillary arrays in gas dosing: Potential chemical reactions-Reference-Cited by-同舟云学术

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A warning concerning the use of glass capillary arrays in gas dosing: Potential chemical reactions

Published:1990-01 Issue:1 Volume:8 Page:148-149
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Leavitt P. K.,Thiel P. A.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.577050

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Gases;Experimental Innovations in Surface Science;2015

2. Behavior of UHV Systems;Experimental Innovations in Surface Science;2015

3. References;Atomic and Molecular Beams;2013-11-27

4. In Situ Processing by Gas or Alkali Metal Dosing and by Cleavage;Specimen Handling, Preparation, and Treatments in Surface Characterization;2002

5. Minimizing Wall Reactions in Ultrahigh Vacuum Systems—Gas Dosers;Experimental Innovations in Surface Science;1998

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