Study on surface reaction of (Ba, Sr)TiO3 thin films by high density plasma etching-Reference-Cited by-同舟云学术

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Study on surface reaction of (Ba, Sr)TiO3 thin films by high density plasma etching

Published:1999-07 Issue:4 Volume:17 Page:2156-2161
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Kim Seung-Bum,Kim Chang-Il,Chang Eui-Goo,Yeom Geun-Young

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.581742

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Targeted synthesis of carbon-supported titanate nanofibers as host structure for nuclear waste immobilization;Radiochimica Acta;2022-04-21

2. Etching mechanism of barium strontium titanate (BST) thin films in CHF3/Ar plasma;Chinese Science Bulletin;2011-06-30

3. Characterization of the high density plasma etching process of CCTO thin films for the fabrication of very high density capacitors;IOP Conference Series: Materials Science and Engineering;2010-02-01

4. Etch Characteristics of Ge2Sb2Te5 (GST), SiO2 and a Photoresist in an Inductively Coupled Cl2/Ar Plasma;Journal of the Korean Physical Society;2007-11-15

5. Repairing of Etching-Induced Damage of High-kBa0.5Sr0.5TiO3Thin Films by Oxygen Surface Plasma Treatment;Japanese Journal of Applied Physics;2006-06-20

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