Use of laser reflectometry for end-point detection during the etching of magnetic thin films-Reference-Cited by-同舟云学术

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Use of laser reflectometry for end-point detection during the etching of magnetic thin films

Published:1997-07 Issue:4 Volume:15 Page:2069-2073
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Khamsehpour B.,Wilkinson C. D. W.,Chapman J. N.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.580610

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dry etching of magnetic tunnel junctions monitored by spectroscopic reflectance;Materials Science in Semiconductor Processing;2011-09

2. Nanofabrication of two-dimensional arrays of magnetite particles for fundamental rock magnetic studies;Journal of Geophysical Research;2009-02-17

3. Magnetization processes in single-layer and laminated CoFe films patterned into multiscale elements with write-head-like geometries;Journal of Applied Physics;2008-07

4. Very high resolution etching of magnetic nanostructures in organic gases;Microelectronic Engineering;2008-05

5. Micromagnetic reversal behavior of multiscale permalloy elements;Journal of Applied Physics;2007-07

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