Oxidation of Ni3Al(111) at 600, 800, and 1050 K investigated by scanning tunneling microscopy-Reference-Cited by-同舟云学术

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Oxidation of Ni3Al(111) at 600, 800, and 1050 K investigated by scanning tunneling microscopy

Published:2000-07 Issue:4 Volume:18 Page:1923-1927
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Rosenhahn A.,Schneider J.,Becker C.,Wandelt K.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.582447

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