Magnetron‐plasma ion beam etching: A new dry etching technique-Reference-Cited by-同舟云学术

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Magnetron‐plasma ion beam etching: A new dry etching technique

Published:1988-05 Issue:3 Volume:6 Page:1379-1383
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Chinn J. D.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.575708

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Reactive sputter etching in axial magnetic fields;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1990-05

2. Superhigh‐rate plasma jet etching of silicon;Applied Physics Letters;1989-10-16

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