The effect of aperturing on radiation damage-induced pattern distortion of x-ray masks
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Published:1995-11
Issue:6
Volume:13
Page:3046
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
2 articles.
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1. Optimization of the refractory x-ray mask fabrication sequence;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1996-11
2. Radiation damage-induced changes in silicon nitride membrane mechanical properties;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-11