A simplified silylation process
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Published:1989-11
Issue:6
Volume:7
Page:1709
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
34 articles.
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3. Chemical Amplification Resists for Microlithography;Microlithography · Molecular Imprinting;2005-02-03
4. Studies on sensitivity and etching resistance of calix[4]arene derivatives as negative tone electron beam resists;Microelectronic Engineering;2003-06
5. Lithographic Resists;Encyclopedia of Polymer Science and Technology;2002-07-15