Optical emission and mass spectroscopic studies of the gas phase during the deposition of SiO2 and a‐Si:H by remote plasma‐enhanced chemical vapor deposition-Reference-Cited by-同舟云学术

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Optical emission and mass spectroscopic studies of the gas phase during the deposition of SiO2 and a‐Si:H by remote plasma‐enhanced chemical vapor deposition

Published:1989-05 Issue:3 Volume:7 Page:1115-1123
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Tsu D. V.,Parsons G. N.,Lucovsky G.,Watkins M. W.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.576239

Cited by 66 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Interface properties of SiO2/GaN structures formed by chemical vapor deposition with remote oxygen plasma mixed with Ar or He;Japanese Journal of Applied Physics;2018-05-10

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3. Capillary jet injection of SiH4 in the high density plasma chemical vapor deposition of SiO2;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2009-07

4. Active species in a large volume N2–O2post-discharge reactor;Journal of Physics D: Applied Physics;2007-03-16

5. A Global Model of Chemical Vapor Deposition of Silicon Dioxide by Direct-Current Corona Discharges in Dry Air Containing Octamethylcyclotetrasiloxane Vapor;Plasma Chemistry and Plasma Processing;2004-12

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