Wafer level critical dimension control in spacer-defined double patterning for sub-72 nm pitch logic technology
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Published:2012-03
Issue:2
Volume:30
Page:021602
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ISSN:2166-2746
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Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
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language:en
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Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Author:
Kim Ryoung-han,Watso Robert,van Dommelen Youri,Finders Jo,Colburn Matthew E.,Levinson Harry J.
Publisher
American Vacuum Society
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials