Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates-Reference-Cited by-同舟云学术

Nucleation mechanism during WS2 plasma enhanced atomic layer deposition on amorphous Al2O3 and sapphire substrates

Published:2018-01 Issue:1 Volume:36 Page:01A105
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Groven Benjamin¹,Mehta Ankit Nalin²,Bender Hugo,Smets Quentin,Meersschaut Johan,Franquet Alexis,Conard Thierry,Nuytten Thomas,Verdonck Patrick,Vandervorst Wilfried²,Heyns Marc³,Radu Iuliana,Caymax Matty,Delabie Annelies¹

Affiliation:

1. Department of Chemistry, KU Leuven (University of Leuven), Celestijnenlaan 200F, B-3001 Leuven, Belgium and imec, Kapeldreef 75, B-3001 Leuven, Belgium

2. Department of Physics, KU Leuven (University of Leuven), Celestijnenlaan 200D, B-3001 Leuven, Belgium and imec, Kapeldreef 75, B-3001 Leuven, Belgium

3. Department of Materials Engineering, KU Leuven (University of Leuven), Kasteelpark Arenberg 44, B-3001 Leuven, Belgium and imec, Kapeldreef 75, B-3001 Leuven, Belgium

Funder

Agentschap voor Innovatie door Wetenschap en Technologie

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5003361

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