Increased drift carrier lifetime in semiconducting boron carbides deposited by plasma enhanced chemical vapor deposition from carboranes and benzene

Author:

Peterson George Glenn1,Echeverria Elena2,Dong Bin3,Silva Joseph P.3,Wilson Ethiyal R.2,Kelber Jeffry A.3,Nastasi Michael4,Dowben Peter A.2

Affiliation:

1. Department of Mechanical and Materials Engineering, University of Nebraska-Lincoln, Walter Scott Engineering Center, Lincoln, Nebraska 68583-0857

2. Department of Physics and Astronomy, University of Nebraska-Lincoln, Jorgensen Hall, 855 North 16th Street, Lincoln, Nebraska 68588-0299

3. Department of Chemistry, University of North Texas, 232 Science Research Bldg. Ave. B and Mulberry Streets, Denton, Texas 76203-5017

4. Department of Mechanical and Materials Engineering, University of Nebraska-Lincoln, Walter Scott Engineering Center, Lincoln, Nebraska 68583-0857 and Nebraska Center for Energy Sciences Research, University of Nebraska-Lincoln, Whittier Research Center, Lincoln, Nebraska 68583-0857

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

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