Application of moiré techniques in scanning‐electron‐beam lithography and microscopy-Reference-Cited by-同舟云学术

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Application of moiré techniques in scanning‐electron‐beam lithography and microscopy

Published:1975-11 Issue:6 Volume:12 Page:1262-1265
ISSN:0022-5355
Container-title:Journal of Vacuum Science and Technology
language:en
Short-container-title:Journal of Vacuum Science and Technology

Author:

Smith Henry I.,Chinn S. R.,DeGraff P. D.

Publisher

American Vacuum Society

Subject

General Engineering

Link

http://avs.scitation.org/doi/pdf/10.1116/1.568513

Cited by 16 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Moiré fringes of HOPG and mica in scanning probe microscopy;Acta Physica Sinica;2003

2. Advances in scanning electron microscope moiré;Experimental Mechanics;2001-06

3. MOIRÉ IN ATOMIC FORCE MICROSCOPE;Experimental Techniques;2000-01

4. Sub-100 nm metrology using interferometrically produced fiducials;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1999

5. Spatial-phase-locked electron-beam lithography: Initial test results;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11

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