Beam and decomposition properties of copper‐containing metalorganic precursors and their use for CuO thin film preparation in chemical beam epitaxy-Reference-Cited by-同舟云学术

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Beam and decomposition properties of copper‐containing metalorganic precursors and their use for CuO thin film preparation in chemical beam epitaxy

Published:1995-03 Issue:2 Volume:13 Page:248-254
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Willmott P. R.,Felder P.,Lingenauer M.,Huber J. R.,Fritsch E.,Bidell W.,Berke H.,Mächler E.,Williams E. J.,Locquet J.‐P.,Bednorz J. G.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.579406

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3. Growth and microstructure of MgO thin films on Si(100) substrates by metal–organic molecular beam epitaxy;Applied Surface Science;2000-07

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