Secondary ion mass spectrometry quantification of elements in TiSi2, TiN, and TiW matrices-Reference-Cited by-同舟云学术

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Secondary ion mass spectrometry quantification of elements in TiSi2, TiN, and TiW matrices

Published:1993-07 Issue:4 Volume:11 Page:2373-2378
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Lux G. E.,Stevie F. A.,Kahora P. M.,Wilson R. G.,Cochran G. W.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.578336

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Quantification of secondary ion mass spectrometry measurements by using ion‐implanted metallic standards;Surface and Interface Analysis;2024-02-28

2. Secondary ion mass spectrometry and its application to thin film characterization;Handbook of Thin Films;2002

3. Gas‐phase transport of WF6 through annular nanopipes in TiN during chemical vapor deposition of W on TiN/Ti/SiO2 structures for integrated circuit fabrication;Applied Physics Letters;1996-11-18

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