Low-temperature back-end-of-line technology compatible with III-V nanowire MOSFETs

Author:

Andric Stefan1,Ohlsson Fhager Lars1,Lindelöw Fredrik1,Kilpi Olli-Pekka1,Wernersson Lars-Erik1ORCID

Affiliation:

1. Department of Electrical and Information Technology, Lund University, Box 118, 221 00 Lund, Sweden

Funder

Stiftelsen för Strategisk Forskning

H2020 LEIT Information and Communication Technologies

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. RF Characterization of Ferroelectric MOS Capacitors;IEEE Electron Device Letters;2024-09

2. Lateral III–V Nanowire MOSFETs in Low-Noise Amplifier Stages;IEEE Transactions on Microwave Theory and Techniques;2022-02

3. Thermal stability of monolayer WS2 in BEOL conditions;Journal of Physics: Materials;2021-01-08

4. Millimeter-Wave Vertical III-V Nanowire MOSFET Device-to-Circuit Co-Design;IEEE Transactions on Nanotechnology;2021

5. The Role of Oxide Traps Aligned With the Semiconductor Energy Gap in MOS Systems;IEEE Transactions on Electron Devices;2020-10

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3