Thin-film metrology of tilted and curved surfaces by imaging Mueller-matrix ellipsometry
Author:
Affiliation:
1. Accurion GmbH, Stresemannstraße 30, 37079 Göttingen, Germany
2. BAM—Bundesanstalt für Materialforschung und -prüfung, Unter den Eichen 44-46, 12203 Berlin, Germany
Funder
Central Innovation Program for small and medium-sized enterprises
Publisher
American Vacuum Society
Subject
Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5122757
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Subwavelength thickness characterization of curved dielectric films exploiting spatially structured entangled photons;Journal of the Optical Society of America B;2023-07-13
2. Mueller matrix imaging of pathological slides with plastic coverslips;Optics Express;2023-04-25
3. Retroreflex ellipsometry for isotropic three-phase systems with nonplanar surfaces;Thin Solid Films;2023-03
4. Systematic analysis of the Rayleigh–Wood anomalies and the symmetry relations of 2D‐periodic nanostructures by imaging spectroscopic ellipsometry;Applied Research;2023-02-11
5. Mueller Matrix Ellipsometric Approach on the Imaging of Sub-Wavelength Nanostructures;Frontiers in Physics;2022-01-21
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