Novel plasma enhanced chemical vapor deposition of highly conformal SiN films and their barrier properties-Reference-Cited by-同舟云学术

Novel plasma enhanced chemical vapor deposition of highly conformal SiN films and their barrier properties

Published:2018-03 Issue:2 Volume:36 Page:022201
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Lee Woo-Jin¹,Choa Yong-Ho²

Affiliation:

1. Process Development Team, Semiconductor R&D Center, Samsung Electronics Co., Ltd, Hwaseong-si, Gyeonggi-do 18448, South Korea

2. Functional Nano-Materials Research Lab., Department of Materials and Chemical Engineering, Hanyang University, Ansan, Gyeonggi-do 15588, South Korea

Funder

National Research Foundation of Korea

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.5002660

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