Real-time spatial-phase locking for vector-scan electron beam lithography

Author:

Yang Yugu,Hastings J. T.

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. High-efficiency metalenses for zone-plate-array lithography;Journal of Vacuum Science & Technology B;2023-09-26

2. Maskless photolithography;Nanolithography;2014

3. Field stitching in thermal probe lithography by means of surface roughness correlation;Nanotechnology;2012-09-05

4. Secondary-electron signal level measurements of self-assembled monolayers for spatial-phase-locked electron-beam lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11

5. New vacuum electron beam processing method based on temperature closed-loop control;Vacuum;2009-01

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