Real-time spatial-phase locking for vector-scan electron beam lithography
Author:
Publisher
American Vacuum Society
Subject
Electrical and Electronic Engineering,Condensed Matter Physics
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. High-efficiency metalenses for zone-plate-array lithography;Journal of Vacuum Science & Technology B;2023-09-26
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3. Field stitching in thermal probe lithography by means of surface roughness correlation;Nanotechnology;2012-09-05
4. Secondary-electron signal level measurements of self-assembled monolayers for spatial-phase-locked electron-beam lithography;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-11
5. New vacuum electron beam processing method based on temperature closed-loop control;Vacuum;2009-01
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