Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating-Reference-Cited by-同舟云学术

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Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating

Published:2004 Issue:3 Volume:22 Page:1040
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:J. Vac. Sci. Technol. A

Author:

Awad Yousef,Lavallée Eric,Lau Kien Mun,Beauvais Jacques,Drouin Dominique,Cloutier Melanie,Turcotte David,Yang Pan,Kelkar Prasad

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Silicon Nanohole Arrays Fabricated by Electron Beam Lithography and Reactive Ion Etching;Sains Malaysiana;2019-06-30

2. Electron Beam Lithography on Irregular Surfaces Using an Evaporated Resist;ACS Nano;2014-04-02

3. Fabrication and application of ordered Si nanopore array induced by Au;Acta Physica Sinica;2014

4. Fabrication of size-tunable, periodic Si nanohole arrays by plasma modified nanosphere lithography and anisotropic wet etching;Applied Surface Science;2012-12

5. Fabrication of Short-Range Ordered Nanoholes on Silicon Surfaces by Electron Irradiation;Japanese Journal of Applied Physics;2007-01-10

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