Application of 4-methyl-1-acetoxycalix[6]arene resist to complementary metal–oxide–semiconductor gate processing
Author:
Publisher
American Vacuum Society
Subject
General Engineering
Cited by 10 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Nanolithography by scanning probes on calixarene molecular glass resist using mix-and-match lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2013-08-12
2. Lithography for enabling advances in integrated circuits and devices;Philosophical Transactions of the Royal Society A: Mathematical, Physical and Engineering Sciences;2012-08-28
3. Molecular glass photoresists for advanced lithography;Journal of Materials Chemistry;2006
4. Lithographic Resists;Kirk-Othmer Encyclopedia of Chemical Technology;2005-06-17
5. Electron beam lithography with negative Calixarene resists on dense materials: Taking advantage of proximity effects to increase pattern density;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005
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