Etching of SiO2 in a narrowly confined plasma of high power density
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Published:1986-09
Issue:5
Volume:4
Page:1227
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ISSN:0734-211X
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Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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language:
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Short-container-title:J. Vac. Sci. Technol. B
Publisher
American Vacuum Society
Subject
General Engineering
Cited by
2 articles.
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1. Quartz: a material for microdevices;Journal of Micromechanics and Microengineering;1991-12-01
2. Electrode separation and convex electrode surfaces in plasma etching;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1987-07