Atomically precise surface engineering of silicon CCDs for enhanced UV quantum efficiency-Reference-Cited by-同舟云学术

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Atomically precise surface engineering of silicon CCDs for enhanced UV quantum efficiency

Published:2013-01 Issue:1 Volume:31 Page:01A103
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Greer Frank,Hamden Erika,Jacquot Blake C.,Hoenk Michael E.,Jones Todd J.,Dickie Matthew R.,Monacos Steve P.,Nikzad Shouleh

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4750372

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. UV Emission from Lanthanide-Doped Upconversion Nanoparticles in Super-Resolution Microscopy: Potential for Cellular Damage;ACS Applied Nano Materials;2023-04-13

2. Optimizing silicon UV detector response with antireflection coatings, solar-blind bandpass filters and linear variable filters;Space Telescopes and Instrumentation 2022: Ultraviolet to Gamma Ray;2022-08-31

3. 2D-doped silicon detectors for UV/optical/NIR and x-ray astronomy;X-Ray, Optical, and Infrared Detectors for Astronomy X;2022-08-29

4. Atomically Thin Delta-Doping of Self-Assembled Molecular Monolayers by Flash Lamp Annealing for Si-Based Deep UV Photodiodes;ACS Applied Materials & Interfaces;2022-06-06

5. High-performance silicon imagers, back illumination using delta and superlattice doping, and their applications in astrophysics, medicine, and other fields;High Performance Silicon Imaging;2020

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