Characterization of cubic boron nitride growth using UV-extended real-time spectroscopic ellipsometry: Effect of plasma additions and dynamic substrate bias steps-Reference-Cited by-同舟云学术

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Characterization of cubic boron nitride growth using UV-extended real-time spectroscopic ellipsometry: Effect of plasma additions and dynamic substrate bias steps

Published:2002-07 Issue:4 Volume:20 Page:1395-1407
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Zapien J. A.,Collins R. W.,Messier R.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.1486226

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study of the phase nature of boron- and nitrogen-containing films by optical and photoelectron spectroscopy;Journal of Vacuum Science & Technology B;2020-07

2. Comparative study of thermal and radical-enhanced methods for growing boron nitride films from diborane and ammonia;Journal of Vacuum Science & Technology A;2020-05

3. Influence of oxygen on the growth of cubic boron nitride thin films by plasma-enhanced chemical vapour deposition;Chinese Physics B;2010-01

4. Ion beam sputter deposition of soft x-ray Mo∕Si multilayer mirrors;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2005

5. Advances in multichannel ellipsometric techniques for in-situ and real-time characterization of thin films;Thin Solid Films;2004-12

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