Author:
Wolff S.,Grosse A.,Schimper H.-J.,Giehl A. R.,Kuhnke M.,Grote R.,Fouckhardt H.
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Cited by
8 articles.
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1. Thick benzocyclobutene etching using high density SF6/O2 plasmas;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2011-01
2. Characterization of reactive ion etching of benzocyclobutente in SF6/O2 plasmas;Microelectronic Engineering;2010-10
3. Reduction of surface roughness of a silicon chip for advanced nanocalorimetry;Sensors and Actuators A: Physical;2008-06
4. Plasma etching of benzocyclobutene in CF4∕O2 and SF6∕O2 plasmas;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2006-05
5. Electrical Characterization of Benzocyclobutene Polymers for Electric Micromachines;IEEE Transactions on Device and Materials Reliability;2004-09