Inductively coupled plasma etching of bulk 6H-SiC and thin-film SiCN in NF3 chemistries-Reference-Cited by-同舟云学术

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Inductively coupled plasma etching of bulk 6H-SiC and thin-film SiCN in NF3 chemistries

Published:1998-07 Issue:4 Volume:16 Page:2204-2209
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Wang J. J.,Lambers E. S.,Pearton S. J.,Ostling M.,Zetterling C.-M.,Grow J. M.,Ren F.,Shul R. J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.581328

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